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Density functional study of gallium clusters on graphene: electronic doping and diffusion

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dc.title Density functional study of gallium clusters on graphene: electronic doping and diffusion en
dc.contributor.author Nezval, David
dc.contributor.author Bartošík, Miroslav
dc.contributor.author Mach, Jindřich
dc.contributor.author Piastek, Jakub
dc.contributor.author Švarc, Vojtěch
dc.contributor.author Konečný, Martin
dc.contributor.author Šikola, Tomáš
dc.relation.ispartof Journal of Physics-Condensed Matter
dc.identifier.issn 0953-8984 Scopus Sources, Sherpa/RoMEO, JCR
dc.date.issued 2020
utb.relation.volume 33
utb.relation.issue 2
dc.type article
dc.language.iso en
dc.publisher IOP Publishing Ltd
dc.identifier.doi 10.1088/1361-648X/abb683
dc.relation.uri https://iopscience.iop.org/article/10.1088/1361-648X/abb683
dc.subject graphene en
dc.subject gallium en
dc.subject density functional theory en
dc.subject clusters en
dc.subject doping en
dc.subject surface diffusion en
dc.description.abstract Motivated by experimental results on transport properties of graphene covered by gallium atoms, the density functional theory study of clustering of gallium atoms on graphene (up to a size of 8 atoms) is presented. The paper explains a rapid initial increase of graphene electron doping by individual Ga atoms with Ga coverage, which is continually reduced to zero, when bigger multiple-atom clusters have been formed. According to density functional theory calculations with and without the van der Waals correction, gallium atoms start to form a three-dimensional cluster from five and three atoms, respectively. The results also explain an easy diffusion of Ga atoms while forming clusters caused by a small diffusion barrier of 0.11 eV. Moreover, the calculations show this barrier can be additionally reduced by the application of an external electric field, which was simulated by the ionization of graphene. This effect offers a unique possibility to control the cluster size in experiments only by applying a gate-voltage to the graphene in a field-effect transistor geometry and thereby without growth temperature assistance. en
utb.faculty Faculty of Technology
dc.identifier.uri http://hdl.handle.net/10563/1010011
utb.identifier.obdid 43882213
utb.identifier.scopus 2-s2.0-85093705866
utb.identifier.wok 000578421900001
utb.identifier.pubmed 32906101
utb.identifier.coden JCOME
utb.source J-wok
dc.date.accessioned 2020-11-05T13:57:28Z
dc.date.available 2020-11-05T13:57:28Z
dc.description.sponsorship Grant Agency of the Czech RepublicGrant Agency of the Czech Republic [17-21413S]; Ministry of Education, Youth and Sports from the Large Infrastructures for Research, Experimental Development and Innovations project 'IT4 Innovations National Super-computing Center' [LM2015070]
utb.ou Department of Physics and Materials Engineering
utb.contributor.internalauthor Bartošík, Miroslav
utb.fulltext.affiliation D Nezval 1,2, M Bartošík 1,2,3*, J Mach 1,2, J Piastek 1,2, V Švarc 1,2, M Konečný 1,2, T Šikola 1,2 1 Institute of Physical Engineering, Brno University of Technology, Technická 2, 616 69 Brno, Czech Republic 2 Central European Institute of Technology, Brno University of Technology, Purkyňova 656/123, 612 00 Brno, Czech Republic 3 Department of Physics and Materials Engineering, Faculty of Technology, Tomas Bata University in Zlín, Vavrečkova 275, 760 01 Zlín, Czech Republic E-mail: [email protected] * Author to whom any correspondence should be addressed
utb.fulltext.dates Received 26 June 2020, revised 27 August 2020 Accepted for publication 9 September 2020 Published 15 October 2020
utb.fulltext.sponsorship We acknowledge the support by the Grant Agency of the Czech Republic (Grant Nos. 17-21413S). This work was also supported by The Ministry of Education, Youth and Sports from the Large Infrastructures for Research, Experimental Development and Innovations project 'IT4Innovations National Supercomputing Center – LM2015070'.
utb.wos.affiliation [Nezval, D.; Bartosik, M.; Mach, J.; Piastek, J.; Svarc, V; Konecny, M.; Sikola, T.] Brno Univ Technol, Inst Phys Engn, Tech 2, Brno 61669, Czech Republic; [Nezval, D.; Bartosik, M.; Mach, J.; Piastek, J.; Svarc, V; Konecny, M.; Sikola, T.] Brno Univ Technol, Cent European Inst Technol, Purkynova 656-123, Brno 61200, Czech Republic; [Bartosik, M.] Tomas Bata Univ Zlin, Fac Technol, Dept Phys & Mat Engn, Vavreckova 275, Zlin 76001, Czech Republic
utb.scopus.affiliation Institute of Physical Engineering, Brno University of Technology, Technická 2, Brno, 616 69, Czech Republic; Central European Institute of Technology, Brno University of Technology, Purkyňova 656/123, Brno, 612 00, Czech Republic; Department of Physics and Materials Engineering, Faculty of Technology, Tomas Bata University in Zlín, Vavrečkova 275, Zlín, 760 01, Czech Republic
utb.fulltext.projects 17-21413S2
utb.fulltext.projects LM2015070
utb.fulltext.faculty Faculty of Technology
utb.fulltext.ou Department of Physics and Materials Engineering
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