Treatment and stability of sodium hyaluronate films in low temperature inductively coupled ammonia plasma

Grulich, Ondřej; Kregar, Zvonimir; Modic, Marko; Vesel, Alenka; Cvelbar, Uroš; Mráček, Aleš; Ponížil, Petr

dc.title	Treatment and stability of sodium hyaluronate films in low temperature inductively coupled ammonia plasma	en
dc.contributor.author	Grulich, Ondřej
dc.contributor.author	Kregar, Zvonimir
dc.contributor.author	Modic, Marko
dc.contributor.author	Vesel, Alenka
dc.contributor.author	Cvelbar, Uroš
dc.contributor.author	Mráček, Aleš
dc.contributor.author	Ponížil, Petr
dc.relation.ispartof	Plasma Chemistry and Plasma Processing
dc.identifier.issn	0272-4324 Scopus Sources, Sherpa/RoMEO, JCR
dc.date.issued	2012
utb.relation.volume	32
utb.relation.issue	5
dc.citation.spage	1075
dc.citation.epage	1091
dc.type	article
dc.language.iso	en
dc.publisher	Springer	en
dc.identifier.doi	10.1007/s11090-012-9387-7
dc.relation.uri	https://link.springer.com/article/10.1007/s11090-012-9387-7
dc.subject	Hyaluronan	en
dc.subject	Surface modification	en
dc.subject	Surface treatment	en
dc.subject	Low-temperature plasma	en
dc.subject	XPS	en
dc.description.abstract	Surface of sodium hyaluronate films was modified in the inductively coupled low temperature ammonia plasma. The amount of bonded nitrogen was measured by the XPS method. The optical emission and temperature of the sample surface were measured during sample processing. Increased processing time and increased discharge power caused a rise of nitrogen concentration on the surface of hyaluronan films, though this effect is limited due to surface saturation and sample destruction at elevated discharge power.	en
utb.faculty	Faculty of Technology
utb.faculty	University Institute
dc.identifier.uri	http://hdl.handle.net/10563/1002981
utb.identifier.rivid	RIV/70883521:28110/12:43867982!RIV13-MSM-28110___
utb.identifier.rivid	RIV/70883521:28610/12:43867982!RIV13-MSM-28610___
utb.identifier.obdid	43868073
utb.identifier.scopus	2-s2.0-84870436541
utb.identifier.wok	000308191500011
utb.source	j-wok
dc.date.accessioned	2012-10-04T12:11:53Z
dc.date.available	2012-10-04T12:11:53Z
utb.ou	Centre of Polymer Systems
utb.contributor.internalauthor	Grulich, Ondřej
utb.contributor.internalauthor	Mráček, Aleš
utb.contributor.internalauthor	Ponížil, Petr
utb.fulltext.affiliation	O. Grulich • Z. Kregar • M. Modic • A. Vesel • U. Cvelbar • A. Mracek • P. Ponizil O. Grulich (&) A. Mracek (&) P. Ponizil Department of Physics and Material Engineering, Faculty of Technology, Tomas Bata University, Nam. T. G. Masaryka 275, 762 72 Zlín, Czech Republic, e-mail: [email protected] A. Mracek - e-mail: [email protected] Z. Kregar - Institute of Physics, Bijenicka 46, 10000 Zagreb, Croatia M. Modic A. Vesel U. Cvelbar - Institute Jozef Stefan, Jamova 39, 1000 Ljubljana, Slovenia A. Mracek P. Ponizil - Centre of Polymer Systems, Tomas Bata University in Zlín, nam. T.G. Masaryka 5555, 760 01 Zlín, Czech Republic
utb.fulltext.dates	Received: 6 December 2011 Accepted: 17 May 2012 Published online: 31 May 2012
utb.fulltext.sponsorship	This article was created with support of the internal grant of TBU in Zlín no. IGA/13/ FT/11/D and no. IGA/26/FT/10/D funded from the resources of specific university research, grant GAČR 104/09/H080 funded from Research and Development Council of the Czech Republic, national budget of Czech Republic and Operational Program Research and Development for Innovations co-funded by the European Regional Development Fund (ERDF) within the framework of project Centre of Polymer Systems (reg. number: CZ.1.05/2.1.00/03.0111). The authors kindly acknowledge dr. Zoran Arsov (Laboratory of Biophysics, Jozef Stefan Institute, Jamova 39, SI-1000 Ljubljana, Slovenia) for ATR-FTIR measurement.
utb.fulltext.projects	IGA/13/ FT/11/D
utb.fulltext.projects	IGA/26/FT/10/D
utb.fulltext.projects	GAČR 104/09/H080
utb.fulltext.projects	CZ.1.05/2.1.00/03.0111
utb.fulltext.faculty	Faculty of Technology
utb.fulltext.ou	Department of Physics and Material Engineering
utb.fulltext.ou	Centre of Polymer Systems
utb.identifier.jel	-